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Basic Information

  • First name: Captain
  • Last name: Nemo
  • Username: captain
  • Email: captain.nemo@nautilus.com
  • Type: Lab staff
  • Date joined: Monday, December 10th, 2012 @ 11:43 AM
  • Last login: Wednesday, November 5th, 2025 @ 7:45 AM
  • Access expiration: Access never expires

Projects

  • Active:
    • Cleanroom Eng
    • Project 3
  • Inactive:
    • Project 2

Tool Qualifications

  • Dicing saw
  • PECVD
  • Sinter

Tool responsibilities

  • Primary owner:
    • 4Wave Cluster Sputter
    • 790 RIE Middle
    • 790 RIE Nitride Left
    • 790 RIE Right
    • A101 Busch & Lomb
    • A101 Leica MZ7
    • A102 Develop Hood
    • A102 Nikon MM-800
    • A102 Spinner Hood
    • A102 Spinner Left
    • A102 Spinner Right
    • A103 Develop Hood
    • A103 Nikon L200
    • A103 Photomask Bench
    • A103 Spinner Hood
    • A103 Spinner Left
    • A103 Spinner Right
    • A104 EBL Develop Hood Left
    • A104 EBL Develop Hood Right
    • A104 EBL Spinner Hood
    • A104 EBL Spinner Left
    • A104 EBL Spinner Right
    • A105 Develop Hood
    • A105 Nikon L200
    • A105 Solvent Hood
    • A106 Base Hood
    • ASML Design Station
    • ASML Stepper
    • Aluminum Wire Bonder
    • AnnealSys RTA
    • Asylum AFM
    • Atomic Layer Deposition
    • B101 Acid Hood
    • B101 Hot Phos Bench
    • B101 KOH Bench
    • B101 RCA Bench
    • B101 Solvent Hood
    • B101 Spin Rinse Dryer
    • B102 Acid Hood
    • B102 Furnace RCA Clean
    • B102 Solvent Hood
    • B102 Spin Rinse Dryer
    • B104 Solvent Hood
    • B107 Nikon L200
    • B107 Nikon SMZ1500
    • Bruker AFM
    • CMP
    • Critical Point Dryer 1
    • Critical Point Dryer 2
    • DUV Resist Stabilizer
    • Dektak XT 1
    • Dektak XT 2
    • Dicing saw
    • Downstream Asher
    • Dynatex GSX Scribe and Break
    • E-Beam Evaporator
    • E-Beam and Thermal Evaporator
    • Ellipsometer
    • FEI FIB 1
    • FEI FIB 2
    • Film Stress
    • Filmetrics F40-UV
    • Filmetrics F50-UV Mapping
    • Flip Chip Bonder
    • Four Dimensions 4pt Probe
    • Gemini 500 FESEM
    • Glow Discharge
    • Gold Wire Bonder
    • Goniometer
    • HMDS Prime
    • Hall Effect Measurement
    • Hotplate 1
    • Hotplate 2
    • Ion Mill
    • JEOL E-beam
    • JEOL E-beam Cleanroom
    • Jandel 4pt Probe
    • LHL Tube 1 Oxide
    • LHL Tube 2 Anneal
    • LHL Tube 3 Nitride
    • LHL Tube 4 LTO
    • Laser Mask Writer
    • Leica EM GP
    • MLA 150
    • Mercury Probe
    • Metal Liftoff
    • Microfluidic Test Station
    • Microwave Asher
    • Nano Enclosure
    • Nano-imprinter
    • NanoMill
    • NanoSpec
    • Nitrogen Oven
    • Oxford III-V Etcher
    • Oxford Metal Etcher
    • Oxford Silicon Etcher
    • PDMS Curing Oven 1
    • PDMS Curing Oven 2
    • PDMS Mixer
    • PDMS Plasma Bonder
    • PDMS Puncher
    • PDMS Spin Coater
    • PECVD
    • Parametric Test
    • Parylene Deposition
    • RHL Tube 1 Oxide
    • RHL Tube 2 Anneal
    • RHL Tube 3 Nitride
    • RHL Tube 4 Poly
    • SPTS Deep Si Etch
    • SPTS HF Vapor Etcher
    • SSEC Piranha 1
    • SSEC Piranha 2
    • SSEC RCA
    • Sensofar Optical Profilometer
    • Silanization Oven
    • Sinter
    • Sputter B104 Left
    • Sputter B104 Right
    • Suss Resist Coater
    • Suss Resist Developer
    • SussMA6
    • SussMA8
    • TITAN TEM
    • Thermal Thin-Al Evaporator
    • Unaxis Deep Si Etcher
    • Unaxis ICP Etcher
    • Vac Oven 1
    • Vac Oven 2
    • Vac Oven 3
    • Veeco AFM
    • Wafer Bonder
    • Wafer Cleaner
    • Wyatt DLS
    • XRD
    • XeF2 Silicon Etcher
    • ZEISS FESEM
  • Backup owner:
    • Dicing saw
    • PECVD
    • Sinter

Physical access levels

  • Cleanroom access